Laboratory Furnace Manufacturer in India

Rectangular heated chamber for ashing, loss on ignition, sintering and general high temperature work on the bench.

Larger chamber volume with a front loading door, for ceramics, glass, refractories and batch sample work.

Horizontal work tube for processes that need a controlled gas flow or a vacuum around the sample.

Hinged clamshell body opens around the work tube, so tubes can be changed or samples reached without dismantling. Two zone and custom builds included.

One unit that works as a muffle chamber or as a tube furnace, useful where bench space is limited.

Lift hearth raises the load into the chamber from below. MoSi₂ elements handle the top of the temperature range.

CVD system with gas handling and precise zone control, for thin film, graphene and nanomaterial research.

Sealed chamber with inlet and outlet ports for nitrogen, argon or forming gas, where oxidation has to be kept out.

Loads from above, so tall or heavy crucibles can be lowered straight into the hot zone.

Fast ramp and quench cycles for wafers and thin films, where heating and cooling rates matter more than soak time.

Inclined rotating tube keeps powders tumbling, so the whole batch sees the same temperature.

Water-cooled vessel with a pumping system, for heating without oxidation or surface contamination.

Tilting body mixes the charge during the cycle, used for melts and reactions that need agitation.